The Growth of Hexagonal Boron Nitride Quantum Dots on Polycrystalline Nickel Films by Plasma-Assisted Molecular Beam Epitaxy
نویسندگان
چکیده
In this report, quantum dots of hexagonal boron nitride (h-BN) were fabricated on the surface polycrystalline Ni film at low growth temperatures (700, 750, and 800 °C) by plasma-assisted molecular beam epitaxy. Reflection high-energy electron diffraction could trace condition during perform formation BN. The observation morphology scanning microscopy atomic force showed nanodots BN films. existence crystal h-BN was determined analysis Raman spectra Kevin probe microscopy. cathodoluminescence performed wavelength 546 610 nm, attributed to trapping centers involving impurities vacancies. Moreover, influence for substrate source cell also investigated in report. When k-cell temperature increased, emission intensity indicating better parameters dots.
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Synthesis of atomically thin hexagonal boron nitride films on nickel foils by molecular beam epitaxy
Hexagonal boron nitride (h-BN) is a layered two-dimensional material with properties that make it promising as a dielectric in various applications. We report the growth of h-BN films on Ni foils from elemental B and N using molecular beam epitaxy. The presence of crystalline h-BN over the entire substrate is confirmed by Raman spectroscopy. Atomic force microscopy is used to examine the morpho...
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ژورنال
عنوان ژورنال: Crystals
سال: 2022
ISSN: ['2073-4352']
DOI: https://doi.org/10.3390/cryst12030347