The Growth of Hexagonal Boron Nitride Quantum Dots on Polycrystalline Nickel Films by Plasma-Assisted Molecular Beam Epitaxy

نویسندگان

چکیده

In this report, quantum dots of hexagonal boron nitride (h-BN) were fabricated on the surface polycrystalline Ni film at low growth temperatures (700, 750, and 800 °C) by plasma-assisted molecular beam epitaxy. Reflection high-energy electron diffraction could trace condition during perform formation BN. The observation morphology scanning microscopy atomic force showed nanodots BN films. existence crystal h-BN was determined analysis Raman spectra Kevin probe microscopy. cathodoluminescence performed wavelength 546 610 nm, attributed to trapping centers involving impurities vacancies. Moreover, influence for substrate source cell also investigated in report. When k-cell temperature increased, emission intensity indicating better parameters dots.

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ژورنال

عنوان ژورنال: Crystals

سال: 2022

ISSN: ['2073-4352']

DOI: https://doi.org/10.3390/cryst12030347